Development of Mask Development of Mask - Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Photolithography technology is a core step in semiconductor device manufacturing process, and lithography machine is also known as mask alignment exposure machine. This is because the commonly used lithography machine is mask alignment lithography. The optical lithography technology has roughly gone through three stages so far, and the mask plays an important role in [...]

Fully Automate Reciprocating Ultrasonic Spray Fluxing System UAM8000 is a fully automate reciprocating ultrasonic spray fluxing system that is designed for spraying water soluble/organic acid fluxes. All of the materials are constructed with materials that are proven compatible with these very corrosive fluxes. This versatile system is easily integrated with all major wave solder machines. The flexibility of selective area fluxing or full board width coverage combined with the ability [...]

Spray Coating Photoresist On Silicon Wafers Spray Coating Photoresist On Silicon Wafers - Ultrasonic Photoresist Coater - Cheersonic Spin coating of photoresist, although an established technique for resist depositionis often not suitable for applications with high topography on the silicon or glasssurface. Since 3D structures such as trenches, V-grooves and holes are basic elementsin building the required functionality of MEMS devices, spin coating usually causesdefects on the resist layer. Especially [...]

Spray Anti-reflective Coating Spray Anti-reflective Coating Using Cheersonic Ultrasonic Spray Systems For future curved display glasses for automotive interior applications, in addition to an anti-glare surface and a hydrophobic coating, a high-quality anti-reflective coating is increasingly required. The three-dimensional surface of the display glasses places very high demands on the coating technology. Antireflective coatings applied by ultrasonic spray technology could be an interesting alternative for us to the classic high-vaccum [...]