Spray Coating Photoresist On Silicon Wafers
Spray Coating Photoresist On Silicon Wafers Spray Coating Photoresist On Silicon Wafers - Ultrasonic Photoresist Coater - Cheersonic Spin coating of photoresist, although an established technique for resist depositionis often not suitable for applications with high topography on the silicon or glasssurface. Since 3D structures such as trenches, V-grooves and holes are basic elementsin building the required functionality of MEMS devices, spin coating usually causesdefects on the resist layer. Especially [...]