Photoresist Coatings in Photolithography Wafer

A simple, economical and repeatable process for photoresist coatings in photolithography wafer processing with fine control of flow rate, coating speed, and deposition amount using an advanced layering technique.

Uniform thin film coverage of various surface profiles.
Capable of coating high aspect ratio trenches with excellent uniformity.
Non-clogging atomized spray.
Ability to deposit thin single micron layers with high uniformity.
Repeatable proven spray process.

Our coating solutions are environmentally-friendly, efficient and highly reliable, and enable dramatic reductions in overspray, savings in raw material, water and energy usage and provide improved process repeatability, transfer efficiency, high uniformity and reduced emissions.

Cheersonic is a developer and manufacturer of ultrasonic coating systems for applying precise, thin film coatings to protect, strengthen or smooth surfaces on parts and components for the microelectronics/electronics, alternative energy, medical and industrial markets, including specialized glass applications in construction and automotive.